Formaldehyde free electroless copper plating compositions and methods

ABSTRACT

The copper electroless baths are formaldehyde free and are environmentally friendly. The electroless copper baths include one or more sulfinate compounds as reducing agents to replace formaldehyde. The electroless baths are stable and deposit a bright copper on substrates.

FIELD OF THE INVENTION

The present invention is directed to formaldehyde free electrolesscopper plating compositions and methods. More specifically, the presentinvention is directed to formaldehyde free electroless copper platingcompositions and methods which are stable, provide uniform copperdeposits and are environmentally friendly.

BACKGROUND OF THE INVENTION

Electroless copper plating baths are used in metallization industriesfor depositing copper on various types of substrates. For example, inthe manufacture of printed wiring boards the electroless copper bathsare used to deposit copper into through-holes and circuit paths as abase for subsequent electrolytic copper plating. Electroless copperplating is also used in the decorative plastics industry for depositionof copper onto non-conductive surfaces as a base for further plating ofcopper, nickel, gold, silver and other metals. Typical baths which arein commercial use today contain divalent copper compounds, chelatingagents or complexing agents for the divalent copper ions, formaldehydereducing agents and various addition agents to make the bath morestable, adjust the plating rate and brighten the copper deposit.Although many of such baths are successful and are widely used, themetallization industry has been searching for alternative electrolesscopper plating baths that do not contain formaldehyde due to its toxicnature.

Formaldehyde is known as an eye, nose and upper respiratory tractirritant. Animal studies have shown that formaldehyde is an in vitromutagen. According to a WATCH committee report (WATCH/2005/06—Workinggroup on Action to Control Chemicals—sub committee with UK Health andSafety Commission) over fifty epidemiological studies have beenconducted prior to 2000 suggested a link between formaldehyde andnasopharyngeal/nasal cancer but were not conclusive. However, morerecent studies conducted by IARC (International Agency for Research onCancer) in the U.S.A. showed that there was sufficient epidemiologicalevidence that formaldehyde causes nasopharyngeal cancer in humans. As aresult the INRS, a French agency, has submitted a proposal to theEuropean Community Classification and Labelling Work Group to reclassifyformaldehyde from a category 3 to a category 1 carcinogen. This wouldmake usage and handling of it more restricted, including in electrolesscopper formulations. Accordingly, there is a need in the metallizationindustry for a comparable or improved reducing agent to replaceformaldehyde. Such a reducing agent must be compatible with existingelectroless copper processes; provide desired capability and reliabilityand meet cost targets.

Hypophosphites have been used as a replacement for formaldehyde, such asin U.S. Pat. No. 4,265,943; U.S. Pat. No. 5,562,760; U.S. Pat. No.6,046,107; and U.S. Pat. No. 6,534,117; however, hypophosphites do notpossess catalytic function on the copper surface. This problem isaddressed by the addition of extra mediator metal ions, such asnickel(II) and cobalt(II), to the plating bath. However, the copperdeposit from such baths is not sufficiently conductive for manyelectronic applications.

Glyoxylic acid is another reducing agent which has been used to replaceformaldehyde. Glyoxylic acid is similar in structure to formaldehyde butits oxidation potential is more positive than formaldehyde. An exampleof a copper bath which includes glyoxylic acid as a reducing agent isU.S. Pat. No. 7,47,3307. However, glyoxylic acid is much more expensivethan formaldehyde and it decomposes quickly. Glyoxylic acid requires astrong alkaline environment to function as a reducing agent because ofits acidic nature. Readily obtainable and conventional alkalinecompounds, such as sodium hydroxide are not suitable for adjusting thepH due to the formation of insoluble sodium oxalate as a by-product.Such a by-product shortens the lifespan of the plating bath.Accordingly, the more expensive base potassium hydroxide is typicallyused to adjust the alkalinity to the desired pH of at least 12. All ofthe above features discourage the use of glyoxylic acid as a reducingagent for electroless copper baths.

Boron containing compounds such as dimethylamine borane, sodiumborohydride and ammonium tetra(n)-butylboranhydride have also been triedas reducing agents with various degrees of success. Examples aredisclosed in U.S. Pat. No. 4,684,550; and U.S. Pat. No. 4,818,286.Unfortunately, these reducing agents are very expensive and associatedwith health and safety hazards. Resultant borates have adverse effectson crops and dimethylamine borane is generally toxic.

Accordingly, there is still a need for an electroless copper bath whichis free of formaldehyde and is both stable, provides acceptable copperdeposits and is environmentally friendly.

SUMMARY OF THE INVENTION

Compositions include one or more sources of copper ions, one or morechelating agents and one or more sulfur containing reducing agentshaving formula:

where X^(y+) is a neutralizing counter cation of formula (I), where y+is an integer of one or greater and may be H⁺, ammonium cation,quaternary ammonium cation, sulfonium cation, phosphonium cation,pyridinium cation, monovalent metal cation, multivalent metal cation,alkaline-earth cation or divalent organometallic cation; R and R′ areindependently hydrogen, hydroxy, hydroxyalkyl, alkoxy, alkoxyalkyl,cyano, halide, haloalkyl, ester, thiol, thiol ester, carboxyl,carboxyalkyl, sulfonate, sulfoxide, substituted, unsubstituted, linearor branched alkyl, substituted, unsubstituted, linear or branchedalkynyl, amino, amine, amide, sulfinate; substituted or unsubstitutedaryl; Z may be hydrogen, substituted, unsubstituted, linear or branchedalkyl, substituted, unsubstituted, linear or branched alkenyl, allyl,acetyl or substituted or unsubstituted aryl; m is an integer of 0 to 6with the proviso that when m is 0 a covalent bond is formed between theS and 0 of —O—(Z)_(n), and n is an integer of 0 or 1, when n=0 theoxygen carriers a negative charge.

Methods include providing a substrate; and electrolessly depositingcopper on the substrate using an electroless copper compositionincluding one or more sources of copper ions, one or more chelatingagents and one or more sulfur containing reducing agents having formula:

wherein X^(y+) is a neutralizing counter cation of formula (I), where y+is an integer of one or greater and may be H⁺, ammonium cation,quaternary ammonium cation, sulfonium cation, phosphonium cation,pyridinium cation, monovalent metal cation, multivalent metal cation,alkaline-earth cation or divalent organometallic cation; R and R′ areindependently hydrogen, hydroxy, hydroxyalkyl, alkoxy, alkoxyalkyl,cyano, halide, haloalkyl, ester, thiol, thiol ester, carboxyl,carboxyalkyl, sulfonate, sulfoxide, substituted, unsubstituted, linearor branched alkyl, substituted, unsubstituted, linear or branchedalkynyl, amino, amine, amide, sulfinate; substituted or unsubstitutedaryl; Z may be hydrogen, substituted, unsubstituted, linear or branchedalkyl, substituted, unsubstituted, linear or branched alkenyl, allyl,acetyl or substituted or unsubstituted aryl; m is an integer of 0 to 6with the proviso that when m is 0 a covalent bond is formed between theS and 0 of —O—(Z)_(n); and n is an integer of 0 or 1, when n=0 theoxygen carriers a negative charge.

Methods also include providing a printed wiring board including aplurality of through-holes; desmearing the through-holes; and depositingcopper on walls of the through-holes using an electroless coppercomposition including one or more sources of copper ions, one or morechelating agents and one or more sulfur containng reducing agents havingformula:

wherein X^(y+) is a neutralizing counter cation of formula (I), where y+is an integer of one or greater and may be H⁺, ammonium cation,quaternary ammonium cation, sulfonium cation, phosphonium cation,pyridinium cation, monovalent metal cation, multivalent metal cation,alkaline-earth cation or divalent organometallic cation; R and R′ areindependently hydrogen, hydroxy, hydroxyalkyl, alkoxy, alkoxyalkyl,cyano, halide, haloalkyl, ester, thiol, thiol ester, carboxyl,carboxyalkyl, sulfonate, sulfoxide, substituted, unsubstituted, linearor branched alkyl, substituted, unsubstituted, linear or branchedalkynyl, amino, amine, amide, sulfinate; substituted or unsubstitutedaryl; Z may be hydrogen, substituted, unsubstituted, linear or branchedalkyl, substituted, unsubstituted, linear or branched alkenyl, allyl,acetyl or substituted or unsubstituted aryl; m is an integer of 0 to 6with the proviso that when m is 0 a covalent bond is formed between theS and 0 of —O—(Z)_(n); and n is an integer of 0 or 1 when n=0 the oxygencarriers a negative charge.

The aqueous based electroless copper compositions are formaldehyde freethus they are environmentally friendly. The environmentally friendlyelectroless copper plating compositions are stable during storage aswell as during copper deposition. Additionally, the environmentallyfriendly electroless copper baths provide uniform copper deposits whichmay have a uniform pink and smooth appearance, and generally have goodbacklight performance. The aqueous electroless copper compositions alsoplate copper at commercially acceptable rates and inhibit the formationof copper oxide (Cu₂O) in the bath. Copper oxide is readily formed inmany formaldehyde free conventional electroless copper plating solutionsat high pH ranges. Such copper oxide formation destabilizes theelectroless copper and copper alloy compositions and inhibits thedeposition of copper and copper alloys on substrates. The inhibition ofthe copper oxide formation enables the autocatalytic process to operateat high pH ranges where copper and copper alloy deposition isthermodynamically favorable.

DETAILED DESCRIPTION OF THE INVENTION

As used throughout this specification, the abbreviations given belowhave the following meanings, unless the context clearly indicatesotherwise: g=gram; mg=milligram; mL=milliliter; L=liter; cm=centimeter;m=meter; mm=millimeter; μm=micron; min.=minute; ppm=parts per million; °C.=degrees Centigrade; wt %=percent by weight; and T_(g)=glasstransition temperature.

The terms “printed circuit board” and “printed wiring board” are usedinterchangeably throughout this specification. The terms “plating” and“deposition” are used interchangeably throughout this specification. Allamounts are percent by weight, unless otherwise noted. All numericalranges are inclusive and combinable in any order except where it islogical that such numerical ranges are constrained to add up to 100%.

Electroless copper compositions are formaldehyde free and areenvironmentally friendly. The compositions are aqueous based and canprovide a copper deposit with a uniform salmon pink appearance and goodbacklight plating results. In general the compositions are stable duringstorage and sufficiently stable during plating to provide acceptable togood copper deposits on substrates.

The electroless copper compositions include one or more sources ofcopper ions, one or more chelating agents and one or more water solublesulfur containing reducing agents having formula:

where X^(y+) is a neutralizing counter cation of formula (I), where y+is an integer of one or greater and may be H⁺, ammonium cation,quaternary ammonium cation, sulfonium cation, phosphonium cation,pyridinium cation, monovalent metal cation, multivalent metal cation,alkaline-earth cation or divalent organometallic cation; R and R′ areindependently hydrogen, hydroxy, hydroxyalkyl such ashydroxyl(C₁-C₆)alky, alkoxy, alkoxyalkyl such as alkoxy(C₁-C₆)alkyl,cyano, halide, haloalkyl, such as a halo(C₁-C₆)alkyl, ester, thiol,thiol ester, carboxyl, carboxyalkyl such as carboxy(C₁-C₆)alkyl,sulfonate, sulfoxide, substituted, unsubstituted, linear or branchedalkyl such as (C₁-C₁₂)alkyl, substituted, unsubstituted, linear orbranched alkynyl such as (C₂-C₁₂)alkynyl, amino, amine such as aprimary, secondary or tertiary amine, amide, sulfinate; substituted orunsubstituted aryl such as (C₆-C₁₈)aryl; Z may be hydrogen, substituted,unsubstituted, linear or branched alkyl such as (C₁-C₁₂)alkyl,substituted, unsubstituted, linear or branched alkenyl such as a(C₂-C₁₂)alkenyl, allyl such as (C₂-C₁₂)allyl, acetyl or substituted orunsubstituted aryl such as (C₆-C₁₈)_(aryl;) m is an integer of 0 to 6with the proviso that when m is 0 a covalent bond is formed between theS and 0 of —O—(Z)_(n); and n is an integer of 0 or 1 when n=0 the oxygencarriers a negative charge. Preferably n=1. Formula (I) is neutral incharge, thus the net negative charge of the anion component must equalthe net positive charge of X^(y+) or the moles of X^(y+) are insufficient amount to neutralize the net negative charge of the moles ofthe anion component of formula (I). Preferably X^(y+) is H⁺, ammoniumcation, a monovalent metal cation, a multivalent metal cation oralkaline-earth cation, more preferably X^(y+) is H⁺, ammonium cation, ora monovalent cation and even more preferably X^(y+) is H⁺ or amonovalent cation. Preferably y+ is 1 or 2, more preferably y+ is 1.Preferably R and R′ are independently hydrogen, linear or branched(C₁-C₆)alkyl, primary, secondary or tertiary amine, amide or sulfinate.More preferably R and R′ are independently hydrogen, linear or branched(C₁-C₆)alkyl, primary or secondary amine or sulfinate. Even morepreferably R and R′ are independently hydrogen, linear or branched(C₁-C₆)alkyl, primary amine or sulfinate and most preferably R and R′are hydrogen, (C₁-C₆)alkyl or primary amine. Preferably Z is hydrogen,substituted, unsubstituted, linear or branched (C₁-C₆)alkyl,(C₂-C₁₂)alkenyl, acetyl or substituted or unsubstituted (C₆-C₁₀)_(aryl.)More preferably Z is hydrogen, substituted or unsubstituted, linear orbranched (C₁-C₆)alkyl, acetyl or substituted or unsubstituted(C₆-C₁₀)_(aryl.) Even more preferably Z is hydrogen, substituted orunsubstituted, linear or branched (C₁-C₆)alkyl, or substituted orunsubstituted (C₆-C₁₀)_(aryl.) Most preferably Z is hydrogen,substituted or unsubstituted, linear or branched (C₁-C₆)alkyl.Preferably, m is an integer from 1 to 6, more preferably from 1 to 5 andeven more preferably from 1 to 3 and most preferably m is 1. The watersoluble reducing agents are included in the compositions in amounts from0.1 g/L to 100 g/L, preferably from 1 g/L to 80 g/L, more preferablyfrom 2 g/L to 60 g/L, most preferably from 2 g/L to 30 g/L.

Monovalent metal cations include, but are not limited to Li^(+,) Na⁺,K⁺, Rb⁺and Cs⁺. Preferably the monovalent cations are chosen from Na⁺and K⁺. Multivalent cations include, but are not limited to Be²⁺, Mg²⁺,Ca²⁺, Sr²⁺and Ba²⁺. Preferably the multivalent cations are chosen fromMg²⁺ and Ca²⁺. More preferably the cations are Na⁺ and K⁺.

Quaternary ammonium cations include, but are not limited to tetraalkylquaternary ammonium cations. Such cations include, but are not limitedto tetramethyl ammonium cation, tetra(n-butyl)ammonium cation andtetraethyl ammonium cation.

Organometallic cations include, but are not limited to 2,2′-bipyridylcations such as [Cu(2,2′-bypyridyl)₂]⁺, [Cu(2,2′-bipyridyl)₂]²⁺ and[Ni(2,2′-bipyridyl)₂]²⁺.

Substituent groups include, but are not limited to hydroxyl, carbonyl,carboxyl, primary, secondary and tertiary amines, carboxy, cyano, nitro,amino, halide, sulfonyl, sulfonate, silfinate, sulfinyl, thiol, aryl,and amide Preferably the substituent groups are hydroxyl, carbonyl,carboxyl, cyano, nitro, halide and thiol. More preferably thesubstituent groups are hydroxyl, carbonyl, carboxyl, nitro, halide andthiol. Most preferably the substituent groups are hydroxyl, carbonyl,carboxyl, halide and thiol. Halides include chloride, bromide, fluorideand iodide. Preferably the halide is chloride, bromide and fluoride.More preferably the halide is chloride and fluoride and most preferablythe halide is chloride.

Sources of copper ions include, but are not limited to, water solublehalides, nitrates, acetates, sulfates and other organic and inorganicsalts of copper. Mixtures of one or more of such copper salts may beused to provide copper ions. Examples are copper sulfate, such as coppersulfate pentahydrate, copper chloride, copper nitrate, copper hydroxideand copper sulfamate. Conventional amounts of copper salts may be usedin the compositions. Sources of copper ions may be included in thecompositions in amounts from 0.2 g/L to 30 g/L or such as from 0.5 g/Lto 20 g/L or such as from 1 g/L to 10 g/L.

Chelating agents are preferably chosen from one or more of saccharides,such as monosaccharides and disaccharides; polycarboxylic acids andsalts thereof and polyaminocarboxylic acids and salts thereof.Monosaccharides include, but are not limited to D-mannitol, xylitol andD-sorbitol, disaccharides include, but are not limited to sucrose,polyaminocarboxylic acids and salts thereof include, but are not limitedto ethylenediaminetetraacetic acid, ethylenediaminetetraacetic acidsodium dibasic and ethylenediaminetetraacetic acid sodium tetrabasic,polycarboxylic acids and salts thereof include, but are not limited tocitric acid, succinic acid, tartaric acid, Rochelle salts which includemixtures of sodium and potassium tatrate, and potassium tartrate.Preferably the chelating agents are ethylenediaminetetraacetic acid,ethylene diamine tetraacetic acid sodium dibasic, Rochelle salts,potassium tartrate, sucrose and D-mannitol, more preferably thechelating agents are ethylenediaminetetraacetic acid, ethylene diaminetetraacetic acid sodium dibasic, Rochelle salts and potassium tartrate,and most preferably the chelating agents are chosen from Rochelle saltsand potassium tartrate. Such chelating agents are included in thecompositions in amounts from 5 g/L to 150 g/L, preferably from 10 g/L to100 g/L, more preferably 20 g/1 to 80 g/L and most preferably from 20g/L to 60 g/L.

Alkaline compounds may be included in the electroless copper platingcompositions to maintain a pH of 9 and higher. Conventional alkalinecompounds may be included in the compositions such as alkali metalhydroxides such as sodium hydroxide, potassium hydroxide and ammoniumhydroxide. Preferably sodium hydroxide or potassium hydroxide is used asthe alkaline compound. Preferably the electroless copper platingcompositions have a pH from 10 to 14, more preferably the electrolesscopper plating compositions have a pH from 11.5 to 13.6. Sufficientamount of alkaline compounds are included to maintain the desired pH. Ingeneral alkaline compounds are included in the electroless coppercompositions in amounts from 4 g/l to 100 g/l or such as from 10 g/l to80 g/L.

Optionally, but preferably, the aqueous electroless copper compositionsinclude one or more stabilizers. Such compounds may stabilize theelectroless copper compositions by providing rate control, refine grainstructure and modify deposit stress and prolong the life of thecompositions during storage or during plating, improve backlightperformance or combinations thereof. Such stabilizers include, but arenot limited to nitrogen containing compounds and sulfur containingcompounds such as amines, alkanolamines, thioamides, azole compoundsderivatives and salts thereof. Amines include, but are not limited tourea and guanidine hydrochloride. Alkanolamines include, but are notlimited to ethanolamine, diethanolamine and triethanolamine Thioamidesinclude, but are not limited to thourea and its derivatives. Azolecompounds include, but are not limited to thiazoles, imidazoles,oxazoles, isoxazoles, pyrazoles and derivatives and salts thereof.Preferably the azole compounds are chosen from benzothiazoles,benzoimidazoles, benzopyrazoles, benzoxazoles, benzisoxazoles andderivatives thereof. Preferably the stabilizers are alkanolamines andazole compounds. More preferably the stabilizers are chosen frombenzothiazoles, derivatives and salts thereof. Most preferably the azolecompounds are chosen from mercaptobenzothiazoles, derivatives and saltsthereof. In general the stabilizers are included in the electrolesscopper compositions in amounts from 0.05 ppm to 1000 ppm, preferablyfrom 0.1 ppm to 500 ppm, more preferably from 0.1 ppm to 100 ppm, evenmore preferably 0.1 ppm to 50 ppm and most preferably from 0.1 ppm to 10ppm.

Optionally, one or more surfactants can be included in the electrolessplating compositions. Conventional surfactants may be used. Suchsurfactants include ionic, non-ionic and amphoteric surfactants. Ionicsurfactants include conventional anionic and cationic surfactants.Typically the surfactants are non-ionic. Examples of non-ionicsurfactants are alkyl phenoxy polyethoxyethanols, polyoxyethylenepolymers having from 20 to 150 repeating units and block copolymers ofpolyoxyethylene and polyoxypropylene. Surfactants may be used inconventional amounts. Typically surfactants are used in amounts of 0.5g/L to 20 g/L or such as from 1 g/L to 10 g/L.

Although the aqueous electroless plating compositions are preferablycopper electroless plating compositions, it is envisioned that one ormore alloying metal may be included in the electroless platingcompositions to deposit a copper alloy on a substrate. Such alloyingmetals include, but are not limited to nickel and tin. Examples ofcopper alloys include copper/nickel and copper/tin.

Sources of nickel ions include one or more conventional water solublesalts of nickel. Sources of nickel ions include, but are not limited tonickel sulfates and nickel halides. Sources of nickel ions may beincluded in the electroless alloying compositions in conventionalamounts. Typically sources of nickel ions are included in amounts of 0.5g/L to 10 g/L or such as from 1 g/l to 5 g/L.

Sources of tin ions may include one or more conventional water solublesalts of tin. Sources of tin ions include, but are not limited to, tinsulfates, tin halides and organic tin sulfonates. Sources of tin ionsmay be included in the electroless compositions in conventional amounts.Typically sources of tin ions are included in amounts of 0.5 g/L to 10g/L or such as 1 g/L to 5 g/L.

The aqueous electroless copper and copper alloy compositions may be usedto deposit a copper or copper alloy on both conductive andnon-conductive substrates. The electroless compositions may be used inmany conventional methods known in the art for electroless plating onconductive and non-conductive substrates. Copper or copper alloydeposition may be done at temperatures at or below 70° C. Preferablyplating is done at room temperature to 45° C. The substrate to be platedwith copper or copper alloy is immersed in the electroless compositionor the electroless composition is sprayed onto the substrate.Conventional plating times may be used to deposit the copper or copperalloy onto the substrate. Deposition may be done for 5 seconds to 30minutes; however, plating times may vary depending on the thickness ofthe copper or copper alloy desired on the substrate. Copper and Copperalloy plating rates may range from 0.1 μm/15 minutes or higher,typically from 0.1 μm/15 minutes to 1 μm/15 minutes, more typically from0.2 μm/15 minutes to 0.5 μm/15 minutes.

Substrates include, but are not limited to printed circuit boards. Suchprinted circuit boards include metal-clad and unclad boards withthermosetting resins, thermoplastic resins and combinations thereof,including fiber, such as fiberglass, and impregnated embodiments of theforegoing.

Thermoplastic resins include, but are not limited to acetal resins,acrylics, such as methyl acrylate, cellulosic resins, such as ethylacetate, cellulose propionate, cellulose acetate butyrate and cellulosenitrate, polyethers, nylon, polyethylene, polystyrene, styrene blends,such as acrylonitrile styrene and copolymers and acrylonitrile-butadienestyrene copolymers, polycarbonates, polychlorotrifluoroethylene, andvinylpolymers and copolymers, such as vinyl acetate, vinyl alcohol,vinyl butyral, vinyl chloride, vinyl chloride-acetate copolymer,vinylidene chloride and vinyl formal.

Thermosetting resins include, but are not limited to, allyl phthalate,furane, melamine-formaldehyde, phenol-formaldehyde and phenol-furfuralcopolymers, alone or compounded with butadiene acrylonitrile copolymersor acrylonitrile-butadiene-styrene copolymers, polyacrylic esters,silicones, urea formaldehydes, epoxy resins, allyl resins, glycerylphthalates and polyesters.

The aqueous electroless copper and copper alloy compositions may be usedto plate both low and high T_(g) resins. Low T_(g) resins have a T_(g)below 160° C. and high T_(g) resins have a T_(g) of 160° C. and above.Typically high T_(g) resins have a T_(g) of 160° C. to 280° C. or suchas from 170° C. to 240° C. High T_(g) polymer resins include, but arenot limited to, polytetrafluoroethylene (PTFE) andpolytetrafluoroethylene blends. Such blends include, for example, PTFEwith polypheneylene oxides and cyanate esters. Other classes of polymerresins which include resins with a high T_(g) include, but are notlimited to, epoxy resins, such as difunctional and multifunctional epoxyresins, bimaleimide/triazine and epoxy resins (BT epoxy),epoxy/polyphenylene oxide resins, acrylonitrile butadienestyrene,polycarbonates (PC), polyphenylene oxides (PPO), polypheneylene ethers(PPE), polyphenylene sulfides (PPS), polysulfones (PS), polyamides,polyesters such as polyethyleneterephthalate (PET) andpolybutyleneterephthalate (PBT), polyetherketones (PEEK), liquid crystalpolymers, polyurethanes, polyetherimides, epoxies and compositesthereof.

The aqueous electroless compositions also may be used to deposit copperor copper alloys on the walls of through-holes or vias of printedcircuit boards. The electroless compositions may be used in bothhorizontal and vertical processes of manufacturing printed circuitboards. Conventional methods may be used to prepare the through-holesfor copper and copper alloy plating.

Through-holes are formed in printed circuit boards by drilling orpunching or any other method known in the art. After the formation ofthe through-holes, the boards are rinsed with water and a conventionalorganic solution to clean and degrease the board followed by desmearingthe through-hole walls. Typically desmearing of the through-holes beginswith application of a solvent swell.

Any conventional solvent swell may be used to desmear the through-holes.Solvent swells include, but are not limited to, glycol ethers and theirassociated ether acetates. Such solvent swells are well known in theart. Commercially available solvent swells include, but are not limitedto CIRCUPOSIT™ HOLE PREP 3303, CIRCUPOSIT™ HOLE PREP 4120 andCIRCUPOSIT™ HOLE PREP 211 formulations available from Dow AdvancedMaterials, Marlborough, Mass.

Optionally, the through-holes are rinsed with water. A promoter may thenbe applied to the through-holes. Conventional promoters may be used.Such promoters include sulfuric acid, chromic acid or alkalinepermanganate. Typically alkaline permanganate is used as the promoter.Examples of commercially available promoters are CIRCUPOSIT™ PROMOTER4130 formulation and CIRCUPOSIT™ 213A-1 formulation from Dow AdvancedMaterials, Marlborough, Mass.

Optionally, the through-holes are rinsed again with water. A neutralizermay then be applied to the through-holes to neutralize any residues leftby the promoter. Conventional neutralizers may be used. Typically theneutralizer is an aqueous acid solution containing one or more amines ora solution of 3 wt % peroxide and 3 wt % sulfuric acid. An example of acommercially available neutralizer is CIRCUPOSIT™ NEUTRALIZER 216-5formulation. Optionally, the through-holes are rinsed with water and theprinted circuit boards are dried.

After desmearing an acid or alkaline conditioner may be applied to thethrough-holes. Conventional conditioners may be used. Such conditionersmay include one or more cationic surfactants, non-ionic surfactants,complexing agents and pH adjusters or buffers. Commercially availableacid conditioners include, but are not limited to CIRCUPOSIT™CONDITIONER 3320 and CIRCUPOSIT™ CONDITIONER 3328 formulations availablefrom Dow Advanced Materials, Marlborough, Mass. Alkaline conditionersinclude, but are not limited to, aqueous alkaline surfactant solutionscontaining one or more quaternary amines and polyamines. Commerciallyavailable alkaline surfactants include, but are not limited toCIRCUPOSIT™ CONDITIONER 231, 3325 and 3327 formulations also availablefrom Dow Advanced Materials. Optionally, the through-holes are rinsedwith water after conditioning.

Conditioning is typically followed by microetching the through-holes.Conventional microetching compositions may be used. Microetching isdesigned to provide a micro-roughened copper surface on exposed coppersuch as innerlayers and surface to enhance subsequent adhesion ofdeposited electroless and electroplate. Microetches include, but are notlimited to 60 g/L to 120 g/L sodium persulfate or sodium or potassiumoxymonopersulfate and sulfuric acid (2%) mixture, or generic sulfuricacid/hydrogen peroxide. An example of a commercially availablemicroetching composition includes CIRCUPOSIT™ MICROETCH 3330 formulationavailable from Dow Advanced Materials. Optionally, the through-holes arerinsed with water.

A conventional pre-dip may then be applied to the microetchedthrough-holes. A commercially available pre-dip is CATAPOSIT™ 404formulation available from Dow Advanced Materials. Optionally, thethrough-holes are rinsed with cold water.

A catalyst may then be applied to the through-holes. Any conventionalcatalyst may be used. The choice of catalyst depends on the type ofmetal to be deposited on the walls of the through-holes. Typically thecatalysts are colloids of noble and non-noble metals. Such catalysts arewell known in the art and many are commercially available or may beprepared from the literature. Examples of non-noble metal catalystsinclude copper, aluminum, cobalt, nickel, tin and iron. Typically noblemetal catalysts are used. Noble metal colloid catalysts include, forexample, gold, silver, platinum, palladium, iridium, rhodium, rutheniumand osmium. More typically, noble metal catalysts of silver, platinum,gold and palladium are used. Most typically silver and palladium areused. A commercially available catalyst is CATAPOSIT™ 44 palladium/tincatalyst available from Dow Advanced Materials. The through-holesoptionally can be rinsed with water after application of the catalyst.

The walls of the through-holes are then plated with copper or copperalloy with an electroless composition as described above. Typicallycopper is plated on the walls of the through-holes. Plating times andtemperatures are also described above.

After the copper or copper alloy is deposited on the walls of thethrough-holes, the through-holes are optionally rinsed with water.Optionally, anti-tarnish compositions may be applied to the metaldeposited on the walls of the through-holes. Conventional anti-tarnishcompositions may be used. The through-holes may optionally be rinsed bya hot water rinse at temperatures exceeding 30° C. and then the boardsmay be dried.

After the through-holes are plated with copper or copper alloy, thesubstrates may undergo further processing. Further processing mayinclude conventional processing by photoimaging and further metaldeposition on the substrates such as electrolytic metal deposition of,for example, copper, copper alloys, tin and tin alloys.

The aqueous electroless copper compositions are formaldehyde free thusthey are environmentally friendly. The environmentally friendlyelectroless copper plating compositions are stable during storage aswell as during copper deposition. Additionally, the environmentallyfriendly electroless copper baths provide uniform copper deposits whichmay have a uniform pink and smooth appearance, and generally have goodbacklight performance. The electroless copper compositions also platecopper at commercially acceptable rates and inhibit the formation ofcopper oxide (Cu₂O) in the bath. Copper oxide is readily formed in manyformaldehyde free conventional electroless copper plating solutions athigh pH ranges. Such copper oxide formation destabilizes the electrolesscopper and copper alloy compositions and inhibit the deposition ofcopper and copper alloys on substrates. The inhibition of the copperoxide formation enables the autocatalytic process to operate at high pHranges where copper and copper alloy deposition is thermodynamicallyfavorable.

The following examples are not intended to limit the scope of theinvention but to further illustrate it.

EXAMPLE 1

Two unclad epoxy/glass laminates with dimensions 5 cm×5 cm were providedby Sheng Yi. Each laminate was treated as follows:

-   1. The surface of each laminate was immersed in an aqueous bath    containing 3% CIRCUPOSIT™ CONDITIONER 3320 formulation for 5 minutes    at 40° C.-   2. Each laminate was then rinsed with cold water for 4 minutes at    22° C.-   3. CATAPOSIT™ 404 pre-dip was then applied to each laminate for 1    minute at room temperature.-   4. The laminates were then activated for 5 minutes at 40° C. with a    2% CATAPOSIT™ 44 and CATAPOSIT™ 404 palladium tin catalyst bath for    electroless copper metallization.-   5. The laminates were then rinsed with cold water for 2 minutes.-   6. Each laminate was then immersed in an aqueous electroless copper    plating composition having the formulation in the table below:

TABLE 1 COMPONENT AMOUNT Copper (II) ions from copper sulfate 6.5 g/Lpentahydrate Disodium ethylenediamine tetraacetate di- 28.5 g/L hydrateSodium hydroxymethanesulfinate 0.4 g/L Potassium hydroxide 14 g/L pH12.5

-   7. One laminate was copper plated for 15 minutes at 32° C. with air    agitation and the other laminate was copper plated for 15 minutes at    room temperature without air agitation. No copper oxide red    precipitate was observed in either solution during copper    deposition. The baths appeared stable.-   8. Each copper plated laminate was then rinsed with cold water for 2    minutes.-   9. Each copper plated laminate was then rinsed with deionised water    for 1 minute.-   10. Each copper plated laminate was then placed in a conventional    laboratory convection oven and dried for 15 minutes at 100° C.-   11. After drying, each copper plated laminate was placed in a    conventional laboratory dessicator for 25 minutes or until it cooled    to room temperature.-   12. After drying each copper plated laminate was observed for the    quality of the copper deposit. Each laminate had a salmon pink    copper deposit.-   13. The copper deposit was then etched from each laminate by    immersion in an ammonium chloride buffer of pH 10 and 3% hydrogen    peroxide solution. The resulting clear blue copper (II) solution was    collected.-   14. Several drops of 5% PAN indicator was added to the copper (II)    solution, which was then titrated with 0.05M ethylenediamine    tetraacetic acid solution. The volume in mL of the 0.05M    ethylenediamine tetraacetic acid solution added was recorded.-   15. The copper deposition rate was calculated with this formula:

[(0.05M)(V mL)(10⁻³)(63.546 g/mole)](10⁴)( 1/8.94 g/cm³)(½ S cm²) inunits of μm/(plating time)

where V=volume of 0.05M ethylenediamine tetraacetic acid, molecularweight of copper is 63.546 g/mole, 8.94 g/cm³ is the density of copperand S=surface area of the laminate in cm² which was 5 cm×5 cm, 10⁻³ isthe conversion factor of L to mL and 10⁴ is the conversion factor of cmto μm. The plating rate for the laminate plated at 32° C. was 0.17 μm/15minutes and the plating rate for the laminate plated at room temperaturewas 0.18 μm/15 minutes. The plating rate for each bath was substantiallythe same.

EXAMPLE 2

Five epoxy/glass laminates with a plurality of through-holes anddimensions 2 cm×3.2 cm were provided. Each laminate was prepared forelectroless copper plating as follows:

-   1. The surface of each through-hole laminate was immersed in an    aqueous bath of 11.5% CUPOSIT™ Z sweller and 12.5% CIRCUPOSIT™ HOLE    PREP 211 formulation for 5 minutes at 75° C. Each laminate was then    rinsed with cold water for 3 minutes at 22° C.-   2. 15% CUPOSIT™ Z and 10% CIRCUPOSIT™ 213A-1 oxidizer was then    applied to each through-hole laminate for 10 minutes at 80° C. Each    oxidized laminate was then rinsed with cold water for 3 minutes at    22° C.-   3. The oxidized through-hole laminates were rinsed in 5% CIRCUPOSIT™    NEUTRALIZER 216-5 aqueous neutralizer for 5 minutes at 40° C. The    neutralized through-hole laminate was then rinsed in cold water for    3 minutes at room temperature.-   4. The surface of each through-hole laminate was immersed in 3%    CIRCUPOSIT™ CONDITIONER 3320 aqueous bath for 5 minutes at 40° C.    The treated laminates were rinsed with cold water for 4 minutes at    22° C.-   5. Each through-hole laminate was dipped in an acidic microetch bath    containing 2% sulfuric acid and sodium persulfate with a    concentration at 100 g/L for 1 minute and then rinsed with cold    water for 3 minutes at 22° C.-   6. CATAPOSIT™ 404 pre-dip was then applied to each laminate for 1    minute at room temperature.-   7. The laminates were then primed for 5 minutes at 40° C. with 2%    CATAPOSIT™ 44 and CATAPOSIT™ 404 catalyst bath for electroless    copper metallization. The laminates were then rinsed with cold water    for 2 minutes.-   8. Each through-hole laminate was then immersed in one of the    electroless copper plating compositions described below in Table 2.

TABLE 2 Copper Potassium sulfate Rochelle tartrate Sodium Formulapentahydrate salt dibasic hydroxymethanesulfinate KOH pH 1 6.5 g/L 24g/L — 0.4 g/L 7 g/L 12.5 2 6.5 g/L 48 g/L — 1.6 g/L 7 g/L 12.5 3 6.5 g/L— 28 g/L 0.8 g/L 7 g/L 12.5 4 6.5 g/L — 28 g/L 1.6 g/L 7 g/L 12.5 5 6.5g/L — 28 g/L 3.2 g/L 7 g/L 12.5

-   9. Copper deposition was done for 15 minutes at 32° C. No Cu₂O red    precipitate was observed during copper deposition. Each copper    plated laminate was then rinsed with cold water for 2 minutes.

The plating rates for each formula were determined using the methoddescribed in Example 1 above. The copper plating rates for formulae 1-5were 0.29 μm/15 min., 0.32 μm/15min., 0.29 μm/15 min , 0.25 μm/15 min.and 0.42 μm/15 min., respectively. Although the laminate plated withcopper from formulae 3 and 4 had a dark colored copper deposit, thecopper deposits plated with formulae 1, 2 and 5 had a salmon pink copperdeposit.

EXAMPLE 3

Two epoxy/glass laminates with a plurality of through-holes anddimensions 2 cm×3.2 cm were provided. Each laminate was prepared forelectroless copper plating as described in Example 2 above except thatthe electroless copper formulations were composed of the componentsdisclosed in Table 3 below.

TABLE 3 Copper Potassium sulfate Rochelle tartrate Sodium Formulapentahydrate salt dibasic hydroxymethanesulfinate KOH pH 6 6.5 g/L 48g/L — 3.2 g/L 7 g/L 12.5 7 6.5 g/L — 28 g/L 3.2 g/L 7 g/L 12.5

During copper plating formula 6 showed plate-out indicating someinstability; however, the copper deposit on the laminate was salmonpink. The plating rate was determined to be 0.31 μm/15 min. Thestability of formula 7 was better than that of formula 6 and alsoproduced a salmon pink copper deposit on the laminate. The plating ratewas determined to be 0.43 μm/15 min

Each laminate was then sectioned laterally to expose the copper platedwalls of the through-holes. Multiple lateral sections 1 mm thick weretaken from the walls of the sectioned through-holes of each laminate todetermine the through-hole wall coverage using the conventional EuropeanBacklight Grading Scale. The 1 mm sections were placed under aconventional optical microscope of 50× magnification. The quality of thecopper deposit was determined by the amount of light that was observedunder the microscope. If no light was observed the section wascompletely black and was rated a 5 on the backlight scale. If lightpassed through the entire section without any dark areas, this indicatedvery little to no copper metal deposition on the wall and the sectionwas rated 0. If sections had some dark regions as wells as lightregions, they were rated between 0 and 5. The sections plated withformula 6 had an average backlight value of 2.5 and the sections platedwith formula 7 had an average backlight value of 3. The resultsindicated that the electroless copper formulations containing sodiumhydroxymethanesulfinate with Rochelle salts and potassium tartratedibasic were promising for electroless copper plating of printed circuitboards.

EXAMPLE 4

An epoxy/glass laminate with a plurality of through-holes and dimensions2 cm×3.2 cm was provided. The laminate was prepared for electrolesscopper plating as described in Example 2 above except that theelectroless copper formulation was composed of the components disclosedin Table 4 below.

TABLE 4 COMPONENT AMOUNT Copper sulfate pentahydrate 6.5 g/L Potassiumtartrate dibasic 28 g/L Sodium hydroxymethanesulfinate 3.2 g/L KOH 7 g/LGuanidine hydrochloride 2 ppm pH 12.5

Copper plating was done for 15 min. at 32° C. The bath appeared stablewithout any indication of plate-out. The copper deposit on the laminatewas salmon pink. The plating rate was determined to be 0.4 μm/15 min.

The laminate was then sectioned laterally to expose the copper platedwalls of the through-holes. Multiple lateral sections 1 mm thick weretaken from the walls of the sectioned through-holes to determine thethrough-hole wall coverage using the conventional European BacklightGrading Scale. The 1 mm sections were placed under a conventionaloptical microscope of 50× magnification. The quality of the copperdeposit was determined by the amount of light that was observed underthe microscope. The sections plated with the formula in Table 4 had anaverage backlight value of 3.5 out of 5. The addition of the guanidinehydrochloride improved both the stability of the plating bath and thebacklight results in comparison to formulations 6 and 7 in Example 3.

EXAMPLE 5

The method of Example 4 was repeated except that 3 ppm triethanolaminewas substituted for the guanidine hydrochloride. The plating rate wasdetermined to be 0.37 μm/15 min. Although there was some indication ofplate-out, the copper deposit was salmon pink and the average backlightvalue was 4.5 out of 5. The addition of triethanolamine providedadditional improvement in backlight performance while providing a salmonpink copper deposit.

EXAMPLE 6

The method of Example 4 was repeated except that 0.2 ppm sodium2-mercaptobenzothiazole was substituted for the guanidine hydrochloride.The plating rate was determined to be 0.31 μm/15 min. The copper deposithad a dirty-red appearance; however the average backlight value wasdetermined to be 4 out of 5. Although the copper deposit was a dirty-redas opposed to salmon pink, the backlight value was an improvement overthose produced by formulae 6 and 7 of Example 3 and Table 4 of Example 4above.

What is claimed is:
 1. A composition comprising one or more sources ofcopper ions, one or more chelating agents and one or more reducingagents having formula:

wherein X^(y+) is a neutralizing counter cation of formula (I), where y+is an integer of one or greater and may be H⁺, ammonium cation,quaternary ammonium cation, sulfonium cation, phosphonium cation,pyridinium cation, monovalent metal cation, multivalent metal cation ordivalent organometallic cation; R and R′ are independently hydrogen,hydroxy, hydroxyalkyl, alkoxy, alkoxyalkyl, cyano, halide, haloalkyl,ester, thiol, thiol ester, carboxyl, carboxyalkyl, sulfonate, sulfoxide,substituted, unsubstituted, linear or branched alkyl, substituted,unsubstituted, linear or branched alkynyl, amino, amine, amide,sulfinate; substituted or unsubstituted aryl; Z may be hydrogen,substituted, unsubstituted, linear or branched alkyl, substituted,unsubstituted, linear or branched alkenyl, allyl, acetyl or substitutedor unsubstituted aryl; m is an integer of 0 to 6 with the proviso thatwhen m is 0 a covalent bond is formed between the S and 0 of —O—(Z)_(n);and n is an integer of 0 or 1 when n=0 the oxygen carriers a negativecharge.
 2. The composition of claim 1, wherein the one or more reducingagents range from 0.1 g/L to 100 g/L.
 3. The composition of claim 1,wherein the one or more chelating agents is chosen from saccharides,polycarboxylic acids and salts thereof and polyaminocarboxylic acids andsalts thereof.
 4. The composition of claim 1, wherein the one or morechelating agents range from 50 g/L to 150 g/L.
 5. The composition ofclaim 1, further comprising one or more stabilizers.
 6. The compositionof claim 5, wherein the one or more stabilizers are chosen from amines,alkanolamines, thioamides, azole compounds derivatives and saltsthereof.
 7. The composition of claim 5, wherein the one or morestabilizers range from 0.1 ppm to 1000 ppm.
 8. A method comprising: a)providing a substrate; and b) electrolessly depositing copper on thesubstrate using an electroless copper composition comprising one or moresources of copper ions, one or more chelating agents and one or morereducing agents having formula:

wherein X^(y+) is a neutralizing counter cation of formula (I), where y+is an integer of one or greater and may be H⁺, ammonium cation,quaternary ammonium cation, sulfonium cation, phosphonium cation,pyradinium cation, monovalent metal cation, multivalent metal cation ordivalent organometallic cation; R and R′ are independently hydroxy,hydroxyalkyl, alkoxy, alkoxyalkyl, cyano, halide, haloalkyl, ester,thiol, thiol ester, carboxyl, carboxyalkyl, sulfonate, sulfoxide,substituted, unsubstituted, linear or branched alkyl, substituted,unsubstituted, linear or branched alkynyl, amino, amine, amide,sulfinate; substituted or unsubstituted aryl; Z may be hydrogen,substituted, unsubstituted, linear or branched alkyl, substituted,unsubstituted, linear or branched alkenyl, allyl, acetyl or substitutedor unsubstituted aryl; m is an integer of 0 to 6 with the proviso thatwhen m is 0 a covalent bond is formed between the S and 0 of —O—(Z)_(n);and n is an integer of 0 or 1 when n=0 the oxygen carriers a negativecharge.
 9. A method comprising: a) providing a printed wiring boardcomprising a plurality of through-holes; b) desmearing thethrough-holes; and c) depositing copper on walls of the through-holesusing an electroless copper composition comprising one or more sourcesof copper ions, one or more chelating agents one or more reducing agentshaving formula:

wherein X^(y+) is a neutralizing counter cation of formula (I), where y+is an integer of one or greater and may be H⁺, ammonium cation,quaternary ammonium cation, sulfonium cation, phosphonium cation,pyradinium cation, monovalent metal cation, multivalent metal cation ordivalent organometallic cation; R and R′ are independently hydroxy,hydroxyalkyl, alkoxy, alkoxyalkyl, cyano, halide, haloalkyl, ester,thiol, thiol ester, carboxyl, carboxyalkyl, sulfonate, sulfoxide,substituted, unsubstituted, linear or branched alkyl, substituted,unsubstituted, linear or branched alkynyl, amino, amine, amide,sulfinate; substituted or unsubstituted aryl; Z may be hydrogen,substituted, unsubstituted, linear or branched alkyl, substituted,unsubstituted, linear or branched alkenyl, allyl, acetyl or substitutedor unsubstituted aryl; m is an integer of 0 to 6 with the proviso thatwhen m is 0 a covalent bond is formed between the S and 0 of —O—(Z)_(n);and n is an integer of 0 or 1 when n=0 the oxygen carriers a negativecharge.